High-vacuum processes are the basis for many critical steps in chip and semiconductor production. In highly sensitive environments, where even the smallest particles can disrupt processes or damage components, maximum precision, purity and repeat accuracy are essential. Festo offers automation solutions that are precisely tailored to these requirements and use leading technologies that are reliable and compatible with cleanroom requirements.
Typical high-vacuum applications include processes such as deposition, etching or ion implantation. They are often carried out in pressure ranges between 10-⁶ and 10-⁸ mbar and place extremely stringent demands on material resistance, temperature control, speed and repeat accuracy for controlling the process gases. Using innovative components and system solutions, Festo supports its customers in ensuring process quality, minimising downtimes and achieving maximum yields. Whether you need temperature-stable gas valves, low-particle wafer handling or energy-efficient drives, we supply solutions that can be seamlessly integrated into existing systems and at the same time offer space for technological development.