Automation in the semiconductor industry

Precision and performance for optimum production throughput

Boost your semiconductor production with perfect automation solutions for stable processes, maximum precision and minimised space requirements. As a partner to the chip and semiconductor industry, we know the challenges you face. We support you with both innovative standard components and customised solutions that are a perfect fit for your process and system. Our solutions also take into account industry standards, such as those for particle generation or outgassing.

Our high-quality and easily customisable automation solutions offer innovative and competitive technologies that you can use from the front-end and the back-end to advanced packaging processes such as hybrid bonding. They are optimised to minimise contamination and work reliably to maintain your yield in the long term. Thanks to their design, you can often reduce energy costs and your carbon footprint too.

Festo solutions for semiconductor manufacturing

Gate valve control solution

Application area:
load-lock chamber / handling system / process chamber

Highlights of application:

  • Significantly reduce the impact force generated when the door valve is switched
  • The application program achieves the control of multiple valves in a single component
  • High repeatability through digital parameter set
  • Easy to trace - ideal for Industrial IoT

Customized solution:
In the semiconductor industry EFEM wafer transfer equipment, the application solution of the motion terminal system filling the FOUP carrier with inert gas can effectively reduce the pollution particles generated when the valve is switched.

N2 Purge system

Application area:
Application solution for advanced semiconductor wafer manufacturing processes that require micro-pollution prevention (AMC Free) in various wafer transportation and storage occasions such as STOCKER, FOUP, OHT, and STB.

Highlights of application:

  • Precise humidity control through flow control and humidity detection
  • Piezo valve design for precise flow control up to 200 liters per minute
  • Simplify engineering design, commissioning and operation, integrated module design, ready-to-install solution
  • Multi units of MFC can be integrated into a motion terminal for setup

Customized solution:

Festo pneumatic control application solutions can reduce wafer oxidation and maintain a dry state to stabilize the FOUP internal environment. In the N2 Purge system, various sensors and flow controllers are used to cooperate, and the precise proportional control of the piezoelectric valve is used to achieve accurate flow control, and data collection and transmission are realized through communication.

In addition, using the digital pneumatic technology of Festo motion terminal, not only precisely controlling the pressure/flow rate of the air knife during blowing, but also the integrated smart sensor can be used for control, diagnosis and self-learning tasks, so that the parameter combination can be optimally matched.

Lift Pin control solution

Application area:

Aimed at the corrugated cylinder used to control Lift Pin in semiconductor equipment

Highlights of application:

To achieve accurate control and monitoring of the time, speed and accuracy of pneumatic technology in operation, and to achieve a smooth and synchronous up and down operation of the wave. Standardize Lift Pin adjustments to replace previous blind adjustments and save maintenance time.

Customized solution:

  • Closed-loop solution: realize advanced pneumatic control technology through VTEM, including time, acceleration and deceleration, and synchronous operation.
  • Open-loop solution: use Festo customized solution, the software and hardware of the original equipment can be seamlessly upgraded without any changes.
  • Precise controlled by piezo valves shortens Tack Time and increases productivity.

Cylinder synchronization control

Special gas supply and chemical polishing gas control unit

Application area:

Semiconductor (both special gas supply and chemical polishing gas control units are used in the semiconductor front-end processes)

Highlights of application:

Without the need for a power source, the gas supply to the gas cylinder can still be cut off; Adopting special OR valve design to ensure uninterrupted system control; Hot swappable function allows for the replacement of solenoid valves without the need to turn off the air supply.

Customized solution:

  • Customized manual safety circuit with multi-channel control using manual valves and logic valves, while also having a more compact design.
  • The specially designed manual energy storage gas cylinder switch system not only retains manual operation mode, but also can automatically shut off gas cylinders without any power source.
  • A simple customized cylinder driven red indicator saves space while ensuring operational safety.

Solutions that always keep your processes stable and reproducible

Our automation solutions ensure yields in semiconductor production are stable and thus economical. The smart design of our components also makes them very adaptable and scalable. This allows you to react quickly and easily to changing production requirements at any time.

These are the benefits that our automation solutions can offer you:

  • High-precision control of movement, pressure and flow rate of the media
  • Clean design for the required level of cleanliness and particle emission
  • Space-saving design for compact installation environments
  • Minimised power consumption and reduced heat generation
  • AI/IoT-ready
  • Reliable and worldwide availability thanks to local manufacture and delivery
  • Meeting the requirements of CopyExactly!
  • Personalised expert support for process-specific challenges
  • Semiconductor-specific greases and seals to prevent unwanted outgassing

Produce with repeat accuracy and control in real time using AI

Rely on our comprehensive solutions to maintain stable and reproducible processes in the long term. Thanks to our semiconductor-specific seals and greases, you also benefit from minimised outgassing for better process sequences. We can tailor our solutions to your requirements, whether for individual temperature control, micro-positioning or precise cyclical control of the gas phases in atomic layer deposition (ALD).

Here are some examples of how we can support you:

  • Temperature control for wafer chucks, process chambers or plasma generators
  • Pin lifting and micropositioning with force detection
  • Valve control for atomic layer deposition (ALD)
  • Safe purging and regeneration of vacuum chambers
  • Pilot control of UHP valves for reliably controlling process gases